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sf6 o2 Analysis factory

sf6 o2 Analysis factory

APPLIED PHYSICS LETTERS 94, 071501 2009 In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6 / O2 cryoetching process J. Pereira,1 L. E. Pichon,1,2 R.

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